Hitachi S570 LaB6 SEM

Hitachi S570 LaB6 SEM

Feature

Description

PERFORMANCE2.5 nm resolution (secondary electron image)
20 to 100,000x magnification; 12 to 100,000x magnification with large-sized specimen stage
ELECTRON GUNPre-centered LaB6 filament; exchange requires air leak
ACCELERATING VOLTAGE0.5 to 3 kV in 100 V steps
3 to 30 kV in 1 kV steps
BEAM CURRENT300 μA maximum
BIASAuto bias system
ALIGNMENT2-stage electromagnetic alignment
LENS SYSTEM3-stage electromagnetic lens (high-excitation objective lens)
OBJECTIVE APERATUREMovable aperture, 4 openings selectable and finely adjustable from outside vacuum
Self-cleaning thin film
STIGMATOR COILElectromagnetic type
SCANNING COIL2-stage electromagnetic type
MOTION RANGEX: 0 to 40 mm; 0 to 100 mm large stage
Y: 0 to 40 mm; 0 to 50 mm large stage
Z: 5 to 35 mm continuous; 20 to 60 mm large stage
Tilt: -20º to +90º continuous; 0º to 60º large stage
Rotation: 360º continuous
SPECIMEN SIZE150 mm diameter maximum
SPECIMEN STUB SIZE6 mm diameter (ultrahigh resolution); 50 mm diameter
SPECIMEN EXCHANGERequires air leak