Feature | Description |
|---|---|
| PERFORMANCE | 3.5 nm resolution (secondary electron image) 20 to 100,000x magnification; 12 to 100,000x magnification with large-sized specimen stage |
| ELECTRON GUN | Pre-centered tungsten hairpin type filament; filament exchange requires air leak |
| ACCELERATING VOLTAGE | 0.5 to 3 kV in 100 V steps 3 to 30 kV in 1 kV steps |
| BEAM CURRENT | 300 μA maximum |
| BIAS | Auto bias system |
| ALIGNMENT | 2-stage electromagnetic alignment |
| LENS SYSTEM | 3-stage electromagnetic lens (high-excitation objective lens) |
| OBJECTIVE APERATURE | Movable aperture, 4 openings selectable and finely adjustable from outside vacuum Self-cleaning thin film |
| STIGMATOR COIL | Electromagnetic type |
| SCANNING COIL | 2-stage electromagnetic type |
| MOTION RANGE | X: 0 to 40 mm; 0 to 100 mm large stage Y: 0 to 40 mm; 0 to 50 mm large stage Z: 5 to 35 mm continuous; 20 to 60 mm large stage Tilt: -20º to +90º continuous; 0º to 60º large stage Rotation: 360º continuous |
| SPECIMEN SIZE | 150 mm diameter maximum |
| SPECIMEN STUB SIZE | 6 mm diameter (ultrahigh resolution); 50 mm diameter |
| SPECIMEN EXCHANGE | Requires air leak |